We design and perfect the properties of complex magnetic oxides for electronic uses.
We apply the layering capability of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) for the growth of oxide magnets and their integration with semiconductors and into all-oxide hybrids.
We use synchrotron radiation to investigate the electronic properties of oxide hybrids.
Besides XPS, XMCD, XANES and ARPES, we apply the hard X-ray variant of photoemission spectroscopy (HAXPES) to study oxide multilayers and depth-profile functional oxide interfaces.
We interface-engineer oxide heterostructures to control their full spectrum of electronic properties.
We realize magnetic oxide-based nanostructured contacts and study 2D, 3D and tunneling spin-electronic transport in novel all-oxide hybrids.
Open Ph.D. Position
01.03.2018 We are seeking for a motivated PhD student on the topic: Interface Engineering of ferroelectric HfO2 in novel FETs The full job offer can be found here: http://www.fz-juelich.de/SharedDocs/Stellenangebote/_common/dipldok/d044-2018-pgi-6.html
January 2018 Within an EU funded Project a team of 8 partners, including a major European semiconductor company, the leader in the field of ferroelectric HfO2 and a large technology laboratory, originating from 5 EU states, will join forces to deliver experimental demonstrators creating the opportunity for the EU industry to establish a dominant position[…]